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Asm lvc 414 liquid vapor mass flow controller mfc 10SLM


ASM LVC 414 Liquid Vapor Mass Flow Controller MFC 10SLM
Advanced Semiconductor Materials Electronic Vaporizer Controller
* True vapor mass flow in bubbler systems.
* Defeats influence of liquid level, temperature and pressure.
* Liquid level surveillance possible.
* Mounting position insensitive.
* Good surface finish for ultra clean operation.
* Heating temperature of bubbler much lower compared with direct vaporization.
* Thermal control valve design gives :
* a normally open flow path for gas line purging when power is off
Electronic Vaporizer controller LVC-414 has been designed to accurately measure
and control the mass flow rate (grams/min) of doping materials by varying the
flow of carrier gas through a bubbler containing the source material. Source
materials include SiCl4, SiHCl3, POCl13, GeCl4 and BBr3. Other doping material
can also be controlled, provided that they vaporize with adequate concentration
for accurate ratiodetection. Carrier gases include H2, He, N2, O2 and Ar.
Three outputs are provided :
These outputs can be monitored with any 5 volt D.C. voltmeter with a sensitivity of
1000 ohms/volt or more. A built-in valve varies the carrier mass flow rate to control
the source gram/min. selected by an external control voltage. A single small package
contains the flowmeter section, ratio detector, control valve and the electronics.
* MINIMUM CARRIER GAS FLOW: 5% of maximum
* MAXIMUM SOURCE FLOW: Up to 40 grams/min. full scale
* OPERATING PRESSURE RANGE: 10-40 psi differential
* MAXIMUM GAS PRESSURE: 60 psig
* GAS AND AMBIENT TEMPERATURE RANGE: 60-90 F (15-35 C)
* RESPONSE: 10 seconds to within 4% of setpoint



Asm lvc 414 liquid vapor mass flow controller mfc 10SLM