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Deposition chamber thermo vg semicon V90 mbe system
Thermo VG Semicon V90 MBE System
The V90 is designed for deposition onto a 4" platen capable of holding one 4" wafer, one 3" wafer, one 2" wafer or three 2" wafers. The system consists of three chambers with independent pumping and control
Deposition chamber, vertical deposition chamber, diffusion pump and Deposition chamber vacuum instrumentation.
Buffer Chamber, Buffer chamber, Buffer chamber vacuum system, Buffer chamber vacuum instrumentation, cassetrac transfer mechanism and buffer chamber single platen outgassing facility (450 C).
Integral Cassette Entry Chamber, Cassette entry chamber integral with buffer chamber, cassette entry lock pumping system, cassette entry chamber vacuum instrumentation, wafer platens and cassette outgassing facility (150 C).
Deposition Facilities, Deposition stage sample manipulator, thermo Cell (Ga) effusion source, group III (Al) effusion sources, two dopant (Si and Be) effusion source, valved compound source for P2 dimer generation from GaP source material, power supply, ten pneumatic soft action source shutters and control module, integrated temperature/shutter real time control unit.
Monitoring Facilities, I-15KeV RHEED system, monitoring ionization gauge, quadrupole mass spectrometer
System Bench, Backout and Electronics Rack, system bench, bakeout system and MBE instrumentation electronics rack, housing
X-GEN Computer control System, control system, process control, manuals
Please call Gina at (***) 734 5033 for additional pictures and information
